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International Journal of Frontiers in Engineering Technology, 2024, 6(5); doi: 10.25236/IJFET.2024.060501.

Module design and virtual debugging of automatic chip cleaning machine based on MCD

Author(s)

An Fang, Zhang Ningju, Huo Yongchao, Ou Juanhua

Corresponding Author:
An Fang
Affiliation(s)

School of Mechanical Technology, Wuxi Institute of Technology, Wuxi, China

Abstract

The traditional ultrasonic cleaning machine can only clean the ordinary stains on the surface of the sapphire wafer, and it is difficult to remove some stubborn stains or marks with strong adhesion due to grinding processing. Aiming at the characteristics of high hardness, thin wafer and small size of sapphire wafer, this paper discusses the design of automatic sapphire wafer cleaning machine based on MCD. Through the analysis of the functional requirements of the equipment, the method of direct cleaning with nylon brush is adopted, and the process flow of automatic control is designed to determine the working rhythm and time allocation. The overall structure is divided into five core components for modular design: forward component, rotation, cleaning, spray and pneumatic door. The forward component will transport the wafer into the cleaning area, the rotating component will ensure uniform force on the wafer during cleaning, the cleaning component will deeply clean the wafer surface through a brush, the spray assembly uses high-pressure water flow to help clean residual stains, and the pneumatic door assembly controls the air flow to ensure a stable cleaning environment. According to the requirements of full automation of equipment control, Siemens S7-1500 PLC is selected for PLC programming and HMI touch screen design of wafer cleaning machine, and the simulation bridge between NX and PLC is established through MCD function to carry out accurate one-to-one corresponding signal mapping to realize the joint adjustment of mechanical parts, sensors, drivers and motion. The virtual electric mechanical joint debugging of automatic chip cleaning machine based on MCD ensures the feasibility and reliability of automatic chip cleaning machine products, and improves the design efficiency and market competitiveness of products.

Keywords

MCD; Sapphire wafer; Cleaning machine; Functional design; Module structure; Virtual debugging

Cite This Paper

An Fang, Zhang Ningju, Huo Yongchao, Ou Juanhua. Module design and virtual debugging of automatic chip cleaning machine based on MCD. International Journal of Frontiers in Engineering Technology (2024), Vol. 6, Issue 5: 1-7. https://doi.org/10.25236/IJFET.2024.060501.

References

[1] HE Mingke. The reconstruction of global semiconductor supply chain in the New stage and its thinking [J]. Journal of Beijing Technology and Business University (Social Sciences Edition), 2023, 38 (01): 62-76.

[2] Sun Xiaotao, Hu Shiming, Gong Huiping. Development status and prospect of electronic gas industry chain in China [J]. Fine & Specialty Chemicals, 2023, 31 (10): 1-9. 

[3] XU Caiyun. Causes and Breakthroughs of China's high-end chip predicament [D]. Southwest University of Finance and Economics, 2019

[4] Qiao Xu, Ma Shuai, Zhang Liang, et al. A design of electrolysis method for cleaning silicon wafer [J]. Technology & Market, 2021, 28 (08): 41-42.

[5] Zhao Baojun, Zhu Fusheng, Wang Wenli, et al. Research on loading and unloading technology of automatic Semiconductor cleaning equipment [J]. Cleaning World, 2019, 35 (10): 58-59+66.

[6] MO Dongming. Status and development trend of sapphire wafer processing technology [J]. Applied Energy Technology, 2022, (08): 43-47.

[7] Niu Yan-E, Li Ning, Sun Wendi. Design of solar polysilicon sheet cleaning device based on ultrasonic cleaning technology [J]. Industrial Heating, 2021, 50 (06): 56-58. 

[8] Huang Zhi-Chao, Tu Lin-Peng, Liu Ju-Ping, et al. Research progress of ultrasonic cleaning technology and equipment [J]. Journal of East China Jiaotong University, 2020, 37 (03): 1-9. 

[9] Yang Jianan, Guo Jianfeng. Application research of a new ultrasonic cleaning equipment and environmental cleaning agent [J]. Science and Technology Wind, 2019(20):10.

[10] Potter G , Tokranova N , Rastegar A ,et al. Design, fabrication, and testing of surface acoustic wave devices for semiconductor cleaning applications[J].Microelectronic Engineering, 2016, 162(08):100-104.

[11] Takahashi M .Fundamental Properties of Microbubble in Semiconductor Cleaning Technology [J].Vacuum and Surface Science, 2018, 61(2):64-69.

[12] Yerriboina N P , Poddar M K , Park J G .Particle Removal by Surfactants During Semiconductor Cleaning[J].Surfactants in Precision Cleaning, 2022:161-191.

[13] Yang Huiyu, Li Xiangxin, Xu Lu, et al. Research and Application of non-damaging single Wafer megasonic wave cleaning System [J]. Electronic Testing, 2019, (22): 93-94. 

[14] Zhuo Zhiguo, Zhou Hai, Shi Jianguo, et al. Research on Wet Cleaning of LED Sapphire Substrate after polishing [J]. Machine Design & Manufacture, 2014, (01): 151-153.

[15] Guo Chenguang, Fan Jiancheng, Yue Haitao, et al. Design and practice of virtual real mapping experimental interactive system based on NX MCD [J]. Journal of Experimental Technology and Management, 2024, 41 (03): 123-130. 

[16] Xu Yalei, Li Wei. Application and Research of Mechanical and electrical Product Conceptual Design based on NX-MCD [J]. Forestry Machinery and Woodworking Equipment, 2023, 51 (12): 19-24.

[17] Chen Xingxu, Feng Heping, Chen Chunliang. Motion Simulation of Gantry Mechanical Arm Polishing Machine based on MCD [J]. Journal of Hebei College of Software Technology, 2024, 26 (01): 24-26+41.