This review presents a comprehensive examination of ion beam sputtering as a versatile technique for the fabrication of quantum dots (QDs), offering insights into the operational principles, historical development, material selection, and the refinement of fabrication techniques. We discuss the optimization of sputtering parameters to achieve precise control over the size, shape, and distribution of QDs, alongside the critical role of characterization methods in assessing their structural, chemical, and optical properties. Applications in fields ranging from biomedicine to optoelectronics are evaluated, highlighting the unique advantages QDs synthesized by ion beam sputtering hold. Furthermore, we address the challenges currently faced, such as scalability, stability, and environmental impact, and explore the potential solutions and interdisciplinary research efforts required to overcome these hurdles. The review culminates in a future outlook that anticipates the integration of advanced automation and machine learning for process optimization, the development of new materials for sustainable QD production, and the expansion of QD applications into emerging technological frontiers. Through this synthesis, we aim to provide a pathway for future research directions and the broader implications of ion beam sputtered QDs in advancing next-generation technologies.

Lu Han, Qiang Wang, Du Wu, Yuansha Xie. Ion Beam Sputtering of Quantum Dots: Techniques, Challenges, and Future Perspectives. Academic Journal of Materials & Chemistry (2024) Vol. 5, Issue 1: 18-24. https://doi.org/10.25236/AJMC.2024.050104.

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